| Titre : |
A User's guide to vacuum technology |
| Type de document : |
texte imprimé |
| Auteurs : |
O'Hanlon, John F. (1937-....), Auteur |
| Editeur : |
Chichester [Royaume-Uni] : John Wiley |
| Année de publication : |
1980 |
| Importance : |
xiii, 402 p. |
| Format : |
24 cm |
| ISBN/ISSN/EAN : |
978-0-471-01624-1 |
| Note générale : |
Réf. bibliogr. Index |
| Langues : |
Anglais (eng) |
| Catégories : |
Vide (Technologie) -- Manuels pratiques et mémentos
|
| Index. décimale : |
621.5 5 |
| Résumé : |
This is a comprehensive review of vacuum technology written for today's system users, i.e., students, technicians, engineers, managers, and scientists involved in semiconductors, optics, and related areas. The emphasis is on the understanding, selection and operation of equipment for the production of process environments. Topics discussed include: residual gas analysis; interpretation of RGA data; material properties; pumping oxygen safely and properties of modern pump fluids; diffusion, ion, turbomolecular, and cryogenic pumps; suitability of the four pump types for high vacuum, ultra-high vacuum, and high gas flow applications; design for hazardous gas pumping - significant in several semiconductor processes; and economics of purchasing, owning, and operating vacuum equipment, and methods of conserving energy. |
A User's guide to vacuum technology [texte imprimé] / O'Hanlon, John F. (1937-....), Auteur . - Chichester (Royaume-Uni) : John Wiley, 1980 . - xiii, 402 p. ; 24 cm. ISSN : 978-0-471-01624-1 Réf. bibliogr. Index Langues : Anglais ( eng)
| Catégories : |
Vide (Technologie) -- Manuels pratiques et mémentos
|
| Index. décimale : |
621.5 5 |
| Résumé : |
This is a comprehensive review of vacuum technology written for today's system users, i.e., students, technicians, engineers, managers, and scientists involved in semiconductors, optics, and related areas. The emphasis is on the understanding, selection and operation of equipment for the production of process environments. Topics discussed include: residual gas analysis; interpretation of RGA data; material properties; pumping oxygen safely and properties of modern pump fluids; diffusion, ion, turbomolecular, and cryogenic pumps; suitability of the four pump types for high vacuum, ultra-high vacuum, and high gas flow applications; design for hazardous gas pumping - significant in several semiconductor processes; and economics of purchasing, owning, and operating vacuum equipment, and methods of conserving energy. |
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